photoresist In A Sentence
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- Polarization effects due to high angles of interference in the photoresist also have to be considered as features approach 40 nm.
- Tecan can structure various types of photoresist using conventional photolithography.
- However, the photographic developer used for photoresist resembles wet etching.
- A digital Fourier transform holographic storage system has been developed for data on photoresist plate.
- First, holographic interference using a He-Cd (325nm) laser was used to create periodic line structure on an i-line sub-micron positive photoresist film.
- In the electroplating step, nickel, copper, or gold is plated upward from the metalized substrate into the voids left by the removed photoresist.
- To fabricate the board, the finished photomask was photolithographically reproduced onto a photoresist coating on the blank copper-clad boards.
- First, photoresist patterns are photo-masked in micrometer detail onto the wafers'surface.
- In a typical process, photoresist patterns are first defined using photolithography.
- The hard bake solidifies the remaining photoresist, to make a more durable protecting layer in future ion implantation, wet chemical etching, or plasma etching.
- This effect can be partly mitigated by using thinner photoresist.
- It is used intensively in photolithography, to deposit layers of photoresist about 1 micrometre thick.
- In addition, 193 nm light has been known to ionize water, producing solvated electrons, which may spread and react with the photoresist, affecting the resolution performance.
- According to the analysis of the photoresist process that got organic initiator conditions, nanometer of physical map was obtained.
- Chemical removal of exposed ( or unexposed ) photoresist results in a three-dimensional structure, which can be filled by the electrodeposition of metal.
- The part of the silicon that was not covered by the photoresist layer from the previous step can now be etched.
- With the third harmonic 355nm nd : yag laser as the exposal source , the lithography of su - 8 photoresist is studied.
- Diffraction causes the image to lose contrast with increasing depth into the photoresist.
- Further development of the wafer brings out the pattern in the photoresist.
- The above defect concerns have led to considerations of using a topcoat layer directly on top of the photoresist.
- Is there a documented maximum hold time for panels with laminated photoresist before copper plating.
- The wafer is developed, and for a positive photoresist, the exposed portions are removed in a chemical process.
- This parameter can be manipulated by diluting the photoresist and adding different components to it to change its properties.
- Therefore, organic pigment must to be fine and symmetrical in the photoresist.
Similar words: Photo Realism, Phonetics, Phoebus, Photodiode, Phonied, Phone In, Phonetist, Phorid, Photocopied, Phosphorescent, Photogram, Phosphoryl, Phocomelia, Phosphoretted, Photosensors, Photomapping, Phosphorylase, Phone Bill, Phonorecord, Phonematics